DIFFER
DIFFER Publication

Development of multilayer coatings and spin-off to XRL applications

Label Value
Author
Abstract

The substantially increased effort on multilayer coating technology, as motivated currently by the application of Mo/Si coatings in Extreme UV lithography, is expected to have a beneficial effect on the technology for multilayer optics in the XUV wavelength range in general. Some examples of new usage of multilayer structures in XRL research are given.

Year of Publication
2001
Journal
Journal De Physique Iv
Volume
11
Number
PR2
Number of Pages
509-510
Date Published
Jul
ISBN Number
1155-4339
DOI
PId
5712e70b1700e7eb113012057012be17
Journal Article
Download citation