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DIFFER Publication
Label | Value |
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Author | |
Abstract |
The substantially increased effort on multilayer coating technology, as motivated currently by the application of Mo/Si coatings in Extreme UV lithography, is expected to have a beneficial effect on the technology for multilayer optics in the XUV wavelength range in general. Some examples of new usage of multilayer structures in XRL research are given. |
Year of Publication |
2001
|
Journal |
Journal De Physique Iv
|
Volume |
11
|
Number |
PR2
|
Number of Pages |
509-510
|
Date Published |
Jul
|
ISBN Number |
1155-4339
|
DOI | |
PId |
5712e70b1700e7eb113012057012be17
|
Journal Article
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