F. Bijkerk

Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H. J., van der Wiel, M. J., Schlatmann, R., … Nikolaus, B. (1993). Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes. Microelectronic Engineering, 21, 67-70. https://doi.org/10.1016/0167-9317(93)90028-4 (Original work published 1993)

Voorma, H. J., & Bijkerk, F. (1992). Design of an Extended Image Field Soft-X-Ray Projection System. Microelectronic Engineering, 17, 145-148. https://doi.org/10.1016/0167-9317(92)90029-q (Original work published 1992)

Bijkerk, F., Louis, E., Turcu, E. C. I., & Tallents, G. J. (1992). High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography. Microelectronic Engineering, 17, 219-222. https://doi.org/10.1016/0167-9317(92)90045-s (Original work published 1992)

van Dorssen, G. E., Louis, E., & Bijkerk, F. (1992). Optimization of X-Ray-Emission from a Laser-Produced Plasma in a Narrow Wavelength Band. Laser and Particle Beams, 10, 759-765. (Original work published 1992)

Vanbrug, H., Bijkerk, F., van der Wiel, M. J., & Vanwingerden, B. (1987). Low-Z Element Analysis by Soft-X-Ray Line Emission of a Laser-Produced Plasma. Journal of Analytical Atomic Spectrometry, 2, 503-507. https://doi.org/10.1039/ja9870200503 (Original work published 1987)