F. Bijkerk

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., Zijlstra, T., de Groot, L. E. M., … Friedrich, J. (1997). Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers. Journal of Vacuum Science & Technology B, 15, 293-298. https://doi.org/10.1116/1.589309 (Original work published 1997)

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., & Spiller, E. (1997). Characterization of multilayers by Fourier analysis of x-ray reflectivity. Journal of Applied Physics, 81, 6112-6119. https://doi.org/10.1063/1.364360 (Original work published 1997)

Voorma, H. J., Louis, E., Bijkerk, F., & Abdali, S. (1997). Angular and energy dependence of ion bombardment of Mo/Si multilayers. Journal of Applied Physics, 82, 1876-1881. https://doi.org/10.1063/1.365992 (Original work published 1997)

Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 1996)

Voorma, H. J., van Dorssen, G. E., Louis, E., Koster, N. B., Smith, A. D., Roper, M. D., & Bijkerk, F. (1996). EXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature. Applied Surface Science, 93, 221-230. https://doi.org/10.1016/0169-4332(95)00347-9 (Original work published 1996)

Louis, E., Voorma, H. J., Koster, N. B., Bijkerk, F., Platonov, Y. Y., Zuev, S. Y., … Salashchenko, N. N. (1995). Multilayer Coated Reflective Optics for Extreme Uv Lithography. Microelectronic Engineering, 27, 235-238. https://doi.org/10.1016/0167-9317(94)00096-d (Original work published 1995)

Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 1994)

Bijkerk, F., Shmaenok, L., Vanhonk, A., Bastiaensen, R., Platonov, Y. Y., Shevelko, A. P., … Nikolaus, B. (1994). Laser-Plasma Sources for Soft-X-Ray Projection Lithography. Journal De Physique Iii, 4, 1669-1677. https://doi.org/10.1051/jp3:1994232 (Original work published 1994)

Bijkerk, F., Louis, E., van Dorssen, G. E., Shevelko, A. P., & Vasilyev, A. A. (1994). Absolute Brightness of Laser Plasmas in the Soft-X-Ray Emission Band. Applied Optics, 33, 82-88. (Original work published 1994)

Bijkerk, F. (1993). Laser-Plasma Xuv Sources, Advances in Performance. Institute of Physics Conference Series, 471-477. (Original work published 1993)