F. Bijkerk

de Bruijn, R., Koshelev, K., & Bijkerk, F. (2003). Enhancement of laser plasma EUV emission by shockwave-plasma interaction. Journal of Physics D-Applied Physics, 36, L88-L91. Retrieved from <Go to ISI>://000185912000003 (Original work published 2003)

Stuik, R., Scholze, F., Tummler, J., & Bijkerk, F. (2002). Absolute calibration of a multilayer-based XUV diagnostic. Nuclear Instruments & Methods in Physics Research Section A-Accelerators Spectrometers Detectors and Associated Equipment, 492, 305-316. Retrieved from <Go to ISI>://000178825300028 (Original work published 2002)

Stuik, R., & Bijkerk, F. (2002). Linearity of P-N junction photodiodes under pulsed irradiation. Nuclear Instruments & Methods in Physics Research Section A-Accelerators Spectrometers Detectors and Associated Equipment, 489, 370-378. Retrieved from <Go to ISI>://000177920500035 (Original work published 2002)

Abdali, S., Gerward, L., Yakshin, A. E., Louis, E., & Bijkerk, F. (2002). Determination of crystallization as a function of Mo layer thickness in Mo/Si multilayers. Materials Research Bulletin, 37, 279-289. Retrieved from <Go to ISI>://000175048300009 (Original work published 2002)

Kooijman, G., et al., de Bruijn, R., Koshelev, K., & Bijkerk, F. (2002). Prepulse enhanced EUV yield from a xenon gas-jet laser produced plasma. In Central Laser Facility, Rutherford Appleton Laboratory, Annual Report 2001-2002.

Bijkerk, F. (2001). Development of multilayer coatings and spin-off to XRL applications. Journal De Physique Iv, 11, 509-510. https://doi.org/10.1051/jp4:2001298 (Original work published 2001)

Stuik, R., Louis, E., Yakshin, A. E., Gorts, P. C., Maas, E. L. G., Bijkerk, F., … Haidl, M. (1999). Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography. Journal of Vacuum Science & Technology B, 17, 2998-3002. https://doi.org/10.1116/1.590942 (Original work published 1999)

Stuik, R., Shmaenok, L. A., Fledderus, H., Andreev, S. S., Shamov, E. A., Zuev, S. Y., … Bijkerk, F. (1999). Development of low-energy x-ray fluorescence micro-distribution analysis using a laser plasma x-ray source and multilayer optics? Journal of Analytical Atomic Spectrometry, 14, 387-390. https://doi.org/10.1039/a807614f (Original work published 1999)

Shevelko, A. P., Shmaenok, L. A., Churilov, S. S., Bastiaensen, R. K., & Bijkerk, F. (1998). Extreme ultraviolet spectroscopy of a laser plasma source for lithography. Physica Scripta, 57, 276-282. https://doi.org/10.1088/0031-8949/57/2/023 (Original work published 1998)

Voorma, H. J., Louis, E., Koster, N. B., & Bijkerk, F. (1998). Temperature induced diffusion in Mo/Si multilayer mirrors. Journal of Applied Physics, 83, 4700-4708. https://doi.org/10.1063/1.367258 (Original work published 1998)