DIFFER

F. Bijkerk

First name
F.
Last name
Bijkerk
Kuznetsov, A. S., Gleeson, M. A., & Bijkerk, F. (2012). Hydrogen-induced blistering mechanisms in thin film coatings. Journal of Physics Condensed Matter, 24(5), 052203. https://doi.org/10.1088/0953-8984/24/5/052203 (Original work published 2025)
Loch, R. A., Sobierajski, R., Louis, E., Bosgra, J., & Bijkerk, F. (2012). Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Opt. Express, 20, 28200–28215. https://doi.org/10.1364/OE.20.028200 (Original work published 2025)
Liu, F., Lee, C. J., Chen, J. Q., Louis, E., van der Slot, P. J. M., Boller, K. J., & Bijkerk, F. (2012). Ellipsometry with randomly varying polarization states. Optics Express, 20(2), 870-878. https://doi.org/10.1364/OE.20.000870 (Original work published 2025)
Bruijn, S., van de Kruijs, R. W. E., Yakshin, A. E., & Bijkerk, F. (2012). Ion assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures. Journal of Applied Physics, 111(6), 064303. https://doi.org/10.1063/1.3693992 (Original work published 2025)
Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E., & Bijkerk, F. (2012). Thermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films. Journal of Applied Physics, 112(5), 054317. https://doi.org/10.1063/1.4751029 (Original work published 2025)
Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M., Mullender, S., & Bijkerk, F. (2012). Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge. Optics Express, 20(11), 11778-11786. https://doi.org/10.1364/OE.20.011778 (Original work published 2025)
Bosgra, J., Verhoeven, J., van de Kruijs, R. W. E., Yakshin, A. E., & Bijkerk, F. (2012). Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth. Thin Solid Films, 522, 228–232. https://doi.org/10.1016/j.tsf.2012.08.051
van den Boogaard, A. J. R., Zoethout, E., Makhotkin, I. A., Louis, E., & Bijkerk, F. (2012). Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics, 112, 123502. https://doi.org/10.1063/1.4768915 (Original work published 2012)
Makhotkin, I., Zoethout, E., Louis, E., Yakunin, A. M., Muellender, S., & Bijkerk, F. (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro Nanolithography, MEMS and MOEMS, 11, 040501. https://doi.org/10.1117/1.JMM.11.4.040501 (Original work published)
Bayraktar, M., Wessels, W., Lee, C. J., Van Goor, F., Koster, G., Rijnders, G., & Bijkerk, F. (2012). Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of Physics D (Applied Physics), 45, 494001. https://doi.org/10.1088/0022-3727/45/49/494001 (Original work published 2012)