F. Bijkerk

Loch, R. A., Sobierajski, R., Louis, E., Bosgra, J., & Bijkerk, F. (2012). Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Opt. Express, 20, 28200–28215. https://doi.org/10.1364/OE.20.028200 (Original work published 2025)

Liu, F., Lee, C. J., Chen, J. Q., Louis, E., van der Slot, P. J. M., Boller, K. J., & Bijkerk, F. (2012). Ellipsometry with randomly varying polarization states. Optics Express, 20(2), 870-878. https://doi.org/10.1364/OE.20.000870 (Original work published 2025)

van den Boogaard, A. J. R., van Goor, F. A., Louis, E., & Bijkerk, F. (2012). Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics Letters, 37, 160-162. https://doi.org/10.1364/OL.37.000160 (Original work published 2025)

Bruijn, S., van de Kruijs, R. W. E., Yakshin, A. E., & Bijkerk, F. (2012). Ion assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures. Journal of Applied Physics, 111(6), 064303. https://doi.org/10.1063/1.3693992 (Original work published 2025)

Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E., & Bijkerk, F. (2012). Thermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films. Journal of Applied Physics, 112(5), 054317. https://doi.org/10.1063/1.4751029 (Original work published 2025)

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M., Mullender, S., & Bijkerk, F. (2012). Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge. Optics Express, 20(11), 11778-11786. https://doi.org/10.1364/OE.20.011778 (Original work published 2025)

Bosgra, J., Verhoeven, J., van de Kruijs, R. W. E., Yakshin, A. E., & Bijkerk, F. (2012). Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth. Thin Solid Films, 522, 228–232. https://doi.org/10.1016/j.tsf.2012.08.051

Makhotkin, I., Zoethout, E., Louis, E., Yakunin, A. M., Muellender, S., & Bijkerk, F. (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro Nanolithography, MEMS and MOEMS, 11, 040501. https://doi.org/10.1117/1.JMM.11.4.040501 (Original work published)

Bayraktar, M., Wessels, W., Lee, C. J., Van Goor, F., Koster, G., Rijnders, G., & Bijkerk, F. (2012). Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of Physics D (Applied Physics), 45, 494001. https://doi.org/10.1088/0022-3727/45/49/494001 (Original work published 2012)

Kuznetsov, A. S., Stuik, R., Bijkerk, F., & Shevelko, A. P. (2012). Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions. Plasma Physics and Controlled Fusion, 54(8), 085019. https://doi.org/10.1088/0741-3335/54/8/085019 (Original work published 2025)