F. Bijkerk

Medvedev, V. V., Yakshin, A. E., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, A. M., Koshelev, K. N., & Bijkerk, F. (2012). Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors. Optics Letters, 37(7), 1169-1171. https://doi.org/10.1364/OL.37.001169 (Original work published 2012)

van den Boogaard, A. J. R., Zoethout, E., Makhotkin, I. A., Louis, E., & Bijkerk, F. (2012). Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics, 112, 123502. https://doi.org/10.1063/1.4768915 (Original work published 2012)

Makhotkin, I., Zoethout, E., Louis, E., Yakunin, A. M., Muellender, S., & Bijkerk, F. (2012). Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet. Journal of Micro Nanolithography, MEMS and MOEMS, 11, 040501. https://doi.org/10.1117/1.JMM.11.4.040501 (Original work published 2012)

Bayraktar, M., Wessels, W., Lee, C. J., Van Goor, F., Koster, G., Rijnders, G., & Bijkerk, F. (2012). Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of Physics D (Applied Physics), 45, 494001. https://doi.org/10.1088/0022-3727/45/49/494001 (Original work published 2012)

Makhotkin, I. A., Louis, E., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E., Seregin, A. Y., … Bijkerk, F. (2011). Determination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves. Physica Status Solidi A-Applications and Materials Science, 208, 2597-2600. https://doi.org/10.1002/pssa.201184256 (Original work published 2011)

Rouzee, A., Johnsson, P., Gryzlova, E. V., Fukuzawa, H., Yamada, A., Siu, W., … Ueda, K. (2011). Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy. Physical Review A, 83(3), 031401. https://doi.org/10.1103/PhysRevA.83.031401 (Original work published 2011)

Loch, R. A., Dubrouil, A., Sobierajski, R., Descamps, D., Fabre, B., Lidon, P., … Mairesse, Y. (2011). Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements. Optics Letters, 36(17), 3386-3388. https://doi.org/10.1364/OL.36.003386 (Original work published 2011)

Chen, J. Q., Louis, E., Wormeester, H., Harmsen, R., van de Kruijs, R., Lee, C. J., … Bijkerk, F. (2011). Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology, 22(10), 105705. https://doi.org/10.1088/0957-0233/22/10/105705 (Original work published 2011)

Louis, E., Yakshin, A. E., Tsarfati, T., & Bijkerk, F. (2011). Nanometer interface and materials control for multilayer EUV-optical applications. Progress in Surface Science, 86(11-12), 255-294. https://doi.org/10.1016/j.progsurf.2011.08.001 (Original work published 2011)

de Rooij-Lohmann, V., Yakshin, A. E., Zoethout, E., Verhoeven, J., & Bijkerk, F. (2011). Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection. Applied Surface Science, 257(14), 6251-6255. https://doi.org/10.1016/j.apsusc.2011.02.054 (Original work published 2011)