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Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements
| Label | Value |
|---|---|
| Author | |
| Abstract |
We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (+/- 40 as) over the main reflectivity peak of the mirror. (C) 2011 Optical Society of America |
| Year of Publication |
2011
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| Journal |
Optics Letters
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| Volume |
36
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| Issue |
17
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| Number of Pages |
3386-3388
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| Date Published |
09/2011
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| Type of Article |
Article
|
| ISBN Number |
0146-9592
|
| DOI | |
| PId |
cd53f695d377735edc61fbfab477e934
|
| Alternate Journal |
Opt. Lett.
|
Journal Article
|
|
| Download citation |
Citation
Loch, R. A., Dubrouil, A., Sobierajski, R., Descamps, D., Fabre, B., Lidon, P., … Mairesse, Y. (2011). Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements. Optics Letters, 36(17), 3386-3388. https://doi.org/10.1364/OL.36.003386 (Original work published 2011)