W. J. Goedheer

Biebericher, A. C., van der Weg, W., Rath, J., Akdim, M., & Goedheer, W. J. (2003). Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency discharges. Journal of Vacuum Science & Technology A, 21, 156-166. Retrieved from <Go to ISI>://000182598200023 (Original work published 2003)

Akdim, M., & Goedheer, W. J. (2003). Modeling the effect of dust on the plasma parameters in a dusty argon discharge under microgravity. Physical Review E, 67. Retrieved from <Go to ISI>://000184085000074 (Original work published 2003)

Akdim, M., & Goedheer, W. J. (2003). Modeling of dust in a silane/hydrogen plasma. Journal of Applied Physics, 94, 104-109. Retrieved from <Go to ISI>://000183642900011 (Original work published 2003)

Akdim, M., & Goedheer, W. J. (2002). Modeling of voids in colloidal plasmas. Physical Review E, 65. Retrieved from <Go to ISI>://000173407500010 (Original work published 2002)

Burm, K. T., Goedheer, W. J., & Schram, D. C. (2002). The isentropic exponent of non-local thermal equilibrium plasmas. Physics Letters A, 294, 47-51. Retrieved from <Go to ISI>://000174137900008 (Original work published 2002)

Biebericher, A. C., van der Weg, W., Goedheer, W. J., & Rath, J. (2002). Mechanism of argon treatment on a growing surface in layer-by-layer deposition of hydrogenated amorphous silicon. Journal of Non-Crystalline Solids, 299, 74-78. Retrieved from <Go to ISI>://000175757400016 (Original work published 2002)

Burm, K. T., Goedheer, W. J., & Schram, D. C. (2001). Simulations of geometrically pinched argon plasmas using an extended one-dimensional model. Journal of Physics D-Applied Physics, 34, 2000-2015. https://doi.org/10.1088/0022-3727/34/13/311 (Original work published 2001)

Burm, K. T., Goedheer, W. J., & Schram, D. C. (2001). Plasma expansion in the preshock region. Journal of Applied Physics, 90, 2162-2168. https://doi.org/10.1063/1.1390309 (Original work published 2001)

Yan, M., Bogaerts, A., Gijbels, R., & Goedheer, W. J. (2001). Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge. Physical Review E, 63. https://doi.org/10.1103/PhysRevE.63.026405 (Original work published 2001)

Chutov, Y. I., Goedheer, W. J., Kravchenko, O. Y., Zuz, V. M., Yan, M., Martins, R., … Kroesen, G. (2000). Radio frequency discharge with dust particles. In Plasma Processing and Dusty Particles (Vol. 382, pp. 69-79).