E. Louis

Ellwi, S. S., Juschkin, L., Ferri, S., Kunze, H. J., & Louis, E. (2001). Investigation of X-ray lasing in a capillary discharge. Journal De Physique Iv, 11, 103-106. https://doi.org/10.1051/jp4:2001219 (Original work published 2001)

Ellwi, S. S., Juschkin, L., Ferri, S., Kunze, H. J., Koshelev, K. N., & Louis, E. (2001). X-ray lasing as a result of an induced instability in an ablative capillary discharge. Journal of Physics D-Applied Physics, 34, 336-339. https://doi.org/10.1088/0022-3727/34/3/315 (Original work published 2001)

Stuik, R., Louis, E., Yakshin, A. E., Gorts, P. C., Maas, E. L. G., Bijkerk, F., … Haidl, M. (1999). Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography. Journal of Vacuum Science & Technology B, 17, 2998-3002. https://doi.org/10.1116/1.590942 (Original work published 1999)

Voorma, H. J., Louis, E., Koster, N. B., & Bijkerk, F. (1998). Temperature induced diffusion in Mo/Si multilayer mirrors. Journal of Applied Physics, 83, 4700-4708. https://doi.org/10.1063/1.367258 (Original work published 1998)

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., Zijlstra, T., de Groot, L. E. M., … Friedrich, J. (1997). Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers. Journal of Vacuum Science & Technology B, 15, 293-298. https://doi.org/10.1116/1.589309 (Original work published 1997)

Voorma, H. J., Louis, E., Koster, N. B., Bijkerk, F., & Spiller, E. (1997). Characterization of multilayers by Fourier analysis of x-ray reflectivity. Journal of Applied Physics, 81, 6112-6119. https://doi.org/10.1063/1.364360 (Original work published 1997)

Voorma, H. J., Louis, E., Bijkerk, F., & Abdali, S. (1997). Angular and energy dependence of ion bombardment of Mo/Si multilayers. Journal of Applied Physics, 82, 1876-1881. https://doi.org/10.1063/1.365992 (Original work published 1997)

Bijkerk, F., Shmaenok, L. A., Louis, E., Voorma, H. J., Koster, N. B., Bruineman, C., … Salashchenko, N. N. (1996). Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks. Microelectronic Engineering, 30, 183-186. https://doi.org/10.1016/0167-9317(95)00222-7 (Original work published 1996)

Voorma, H. J., van Dorssen, G. E., Louis, E., Koster, N. B., Smith, A. D., Roper, M. D., & Bijkerk, F. (1996). EXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature. Applied Surface Science, 93, 221-230. https://doi.org/10.1016/0169-4332(95)00347-9 (Original work published 1996)

Louis, E., Voorma, H. J., Koster, N. B., Bijkerk, F., Platonov, Y. Y., Zuev, S. Y., … Salashchenko, N. N. (1995). Multilayer Coated Reflective Optics for Extreme Uv Lithography. Microelectronic Engineering, 27, 235-238. https://doi.org/10.1016/0167-9317(94)00096-d (Original work published 1995)