E. Louis

Bijkerk, F., Louis, E., van Dorssen, G. E., Shevelko, A. P., & Vasilyev, A. A. (1994). Absolute Brightness of Laser Plasmas in the Soft-X-Ray Emission Band. Applied Optics, 33, 82-88. (Original work published 1994)

Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment. Microelectronic Engineering, 23, 215-218. https://doi.org/10.1016/0167-9317(94)90140-6 (Original work published 1994)

Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H. J., van der Wiel, M. J., Schlatmann, R., … Nikolaus, B. (1993). Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes. Microelectronic Engineering, 21, 67-70. https://doi.org/10.1016/0167-9317(93)90028-4 (Original work published 1993)

Bijkerk, F., Louis, E., Turcu, E. C. I., & Tallents, G. J. (1992). High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography. Microelectronic Engineering, 17, 219-222. https://doi.org/10.1016/0167-9317(92)90045-s (Original work published 1992)

van Dorssen, G. E., Louis, E., & Bijkerk, F. (1992). Optimization of X-Ray-Emission from a Laser-Produced Plasma in a Narrow Wavelength Band. Laser and Particle Beams, 10, 759-765. (Original work published 1992)