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Label | Value |
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Author | |
Abstract |
Ion sputtering yields for Ru, Mo, and Si under Ar+ ion bombardment in the near-threshold energy range have been studied using an in situ weight-loss method with a Kaufman ion source, Faraday cup, and quartz crystal microbalance. The results are compared to theoretical models. The accuracy of the in situ weight-loss method was verified by thickness-decrease measurements using grazing incidence x-ray reflectometry, and results from both methods are in good agreement. These results provide accurate data sets for theoretical modeling in the near-threshold sputter regime and are of relevance for (optical) surfaces exposed to plasmas, as, for instance, in extreme ultraviolet photolithography. |
Year of Publication |
2009
|
Journal |
Journal of Applied Physics
|
Volume |
106
|
Number |
5
|
Number of Pages |
6
|
Date Published |
Sep
|
Type of Article |
Article
|
ISBN Number |
0021-8979
|
Accession Number |
ISI:000269850300134
|
URL | |
PId |
f7b032b0fe554719fdaf1b1e92f63c84
|
Alternate Journal |
J. Appl. Phys.
|
Journal Article
|
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