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Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems

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Abstract

The effect of an amorphous-to-nanocrystalline phase transition on the diffusion across an interface layer of subnanometer thickness has been investigated in real-time. The diffusion in the Mo/B4C/Si thin film structure studied was found to instantaneously enhance by an order of magnitude upon the formation of nanocrystals inducing the atomic-scale onset of grain boundary diffusion. (C) 2010 American Institute of Physics. [doi:10.1063/1.3460107]

Year of Publication
2010
Journal
Journal of Applied Physics
Volume
108
Number
1
Number of Pages
5
Date Published
07/2010
Type of Article
Article
ISBN Number
0021-8979
Accession Number
ISI:000280000400090
URL
PId
128f55f14f334efd6272008864237968
Alternate Journal
J. Appl. Phys.
Journal Article
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Citation
de Rooij-Lohmann, V., Yakshin, A. E., van de Kruijs, R. W. E., Zoethout, E., Kleyn, A. W., Keim, E. G., … Bijkerk, F. (2010). Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems. Journal of Applied Physics, 108, 5. Retrieved from <Go to ISI>://000280000400090 (Original work published 2010)