DIFFER

F. D. Tichelaar

First name
F.
Middle name
D.
Last name
Tichelaar
Sharma, K. ., Ponomarev, M. V., Verheijen, M. A., Kunz, O. ., Tichelaar, F. D., van de Sanden, M. C. M., & Creatore, M. . (2012). Solid-phase crystallization of ultra high growth rate amorphous silicon films. Journal of Applied Physics, 111(10), 5. https://doi.org/10.1063/1.4717951 (Original work published 2025)
Sharma, K. ., Branca, A. ., Illiberi, A. ., Tichelaar, F. D., Creatore, M. ., & van de Sanden, M. C. M. (2011). On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon. Advanced Energy Materials, 1(3), 401-406. https://doi.org/10.1002/aenm.201000074 (Original work published 2025)
Beyene, H. T., Tichelaar, F. D., Verheijen, M. A., van de Sanden, M. C. M., & Creatore, M. . (2011). Plasma-Assisted Deposition of Au/SiO2 Multi-layers as Surface Plasmon Resonance-Based Red-Colored Coatings. Plasmonics, 6(2), 255-260. https://doi.org/10.1007/s11468-010-9197-9 (Original work published 2025)
Dobrovolskiy, S. ., Yakshin, A. E., Tichelaar, F. D., Verhoeven, J. ., Louis, E. ., & Bijkerk, F. . (2010). Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms, 268, 560-567. Retrieved from <Go to ISI>://000276053700004 (Original work published 2025)
Kessels, M. J. H., Verhoeven, J. ., Tichelaar, F. D., & Bijkerk, F. . (2006). Si adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors. Surface Science, 600, 1405-1408. Retrieved from <Go to ISI>://000236455100029 (Original work published 2025)
Kessels, M. J. H., Bijkerk, F. ., Tichelaar, F. D., & Verhoeven, J. . (2005). Determination of in-depth density profiles of multilayer structures. Journal of Applied Physics, 97. Retrieved from <Go to ISI>://000229155600023 (Original work published 2025)
Kessels, M. J. H., Verhoeven, J. ., Tichelaar, F. D., & Bijkerk, F. . (2005). Ion-induced interface layer formation in W/Si and WRe/Si multilayers. Surface Science, 582, 227-234. Retrieved from <Go to ISI>://000229341500025 (Original work published 2025)
Kessels, M. J. H., Verhoeven, J. ., Yakshin, A. E., Tichelaar, F. D., & Bijkerk, F. . (2004). Ion beam induced intermixing of interface structures in W/Si multilayers. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions With Materials and Atoms, 222, 484-490. Retrieved from <Go to ISI>://000223121800016 (Original work published 2025)