A. Bogaerts

De Bleecker, K. ., Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. . (2004). Numerical investigation of particle formation mechanisms in silane discharges. Physical Review E, 69. Retrieved from <Go to ISI>://000221813400085 (Original work published 2024)

De Bleecker, K. ., Bogaerts, A. ., Goedheer, W. ., & Gijbels, R. . (2004). Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model. IEEE Transactions on Plasma Science, 32, 691-698. Retrieved from <Go to ISI>://000222278400026 (Original work published 2024)

De Bleecker, K. ., Bogaerts, A. ., & Goedheer, W. . (2004). Modeling of the formation and transport of nanoparticles in silane plasmas. Physical Review E, 70. Retrieved from <Go to ISI>://000225970700092 (Original work published 2024)

Herrebout, D. ., Bogaerts, A. ., Gijbels, R. ., Goedheer, W. J., & Vanhulsel, A. . (2003). A one-dimensional fluid model for an acetylene RF discharge: A study of the plasma chemistry. IEEE Transactions on Plasma Science, 31, 659-664. Retrieved from <Go to ISI>://000184833400022 (Original work published 2024)

Herrebout, D. ., Bogaerts, A. ., Yan, M. ., Gijbels, R. ., Goedheer, W. ., & Dekempeneer, E. . (2001). One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers. Journal of Applied Physics, 90, 570-579. https://doi.org/10.1063/1.1378059 (Original work published)

Yan, M. ., Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. J. (2001). Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge. Physical Review E, 63. https://doi.org/10.1103/PhysRevE.63.026405 (Original work published 2024)

Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. . (2001). Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radio-frequency glow discharge in argon. Journal of Analytical Atomic Spectrometry, 16, 750-755. https://doi.org/10.1039/b103768b (Original work published 2001)

Yan, M. ., Bogaerts, A. ., Gijbels, R. ., & Goedheer, W. J. (2000). Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: Comparison between Ar and SiH4. Journal of Applied Physics, 87, 3628-3636. https://doi.org/10.1063/1.372392 (Original work published)

Yan, M. ., Bogaerts, A. ., Goedheer, W. J., & Gijbels, R. . (2000). Electron energy distribution function in capacitively coupled RF discharges: difference between electropositive Ar and electronegative SiH4 discharges. Plasma Sources Science & Technology, 9, 583-591. https://doi.org/10.1088/0963-0252/9/4/314 (Original work published 2024)

Bogaerts, A. ., Yan, M. ., Gijbels, R. ., & Goedheer, W. . (1999). Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge. Journal of Applied Physics, 86, 2990-3001. https://doi.org/10.1063/1.371159 (Original work published)