DIFFER
Plasma Solar Fuels Devices Publications

Plasma Solar Fuels Devices Publications

Displaying 301 - 310 of 356

2011

G. M. Wright, J. Westerhout, R. S. Al, E. Alves, L. C. Alves, N. P. Barradas, M. A. van den Berg, D. Borodin, S. Brezinsek, S. Brons , Materials research under ITER-like divertor conditions at FOM Rijnhuizen , Journal of Nuclear Materials , 417 (2011) 457-462, Article; Proceedings Paper (10/2011) ,Open Access , DOI
T. A. R. Hansen, P. G. J. Colsters, M. C. M. van de Sanden, R. Engeln , Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra , Journal of Physics D-Applied Physics , 44 (2011) 355205, Article (09/2011), DOI
E. Oyarzabal, W. A. J. Vijvers, R. S. Al, H. J. van der Meiden, M.J. van der Pol, F. L. Tabares, G. J. van Rooij , Mixing of multiple hydrogen plasma beams in a strong magnetic field by E x B drift-induced rotation , Plasma Physics and Controlled Fusion , 10, 53 (2011) 5013, Article (10/2011), DOI
R. Neu, A. Kallenbach, M. Sertoli, R. Dux, R. Fischer, J. C. Fuchs, A. Janzer, H. W. Muller, S. Potzel, T. Putterich , Tungsten behaviour in radiatively cooled plasma discharges in ASDEX Upgrade , Journal of Nuclear Materials , 1, 415 (2011) S322-S326, Article; Proceedings Paper (08/2011), DOI
E. Langereis, R. Roijmans, F. Roozeboom, M. C. M. van de Sanden, W. M. M. Kessels , Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors , Journal of the Electrochemical Society , 158 (2011) G34-G38, Article (), DOI
J. W. Weber, K. Hinrichs, M. Gensch, M. C. M. van de Sanden, T. W. H. Oates , Microfocus infrared ellipsometry characterization of air-exposed graphene flakes , Applied Physics Letters , 99 (2011) 3, Article (08/2011), DOI
J. Rapp, G. De Temmerman, G. J. van Rooij, P. A. Zeijlmans van Emmichoven, A. W. Kleyn , Plasma-Facing Materials Research For Fusion Reactors At FOM Rijnhuizen , Romanian Journal of Physics , 56 (2011) 30-35, Article; Proceedings Paper () ,Open Access
K. B. Jinesh, J. L. van Hemmen, M. C. M. van de Sanden, F. Roozeboom, J. H. Klootwijk, W. F. A. Besling, W. M. M. Kessels , Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films , Journal of the Electrochemical Society , 158 (2011) G21-G26, Article (), DOI
M. E. Donders, H. C. M. Knoops, M. C. M. van de Sanden, W. M. M. Kessels, P. H. L. Notten , Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films , Journal of the Electrochemical Society , 158 (2011) G92-G96, Article (), DOI
G. Dingemans, N. M. Terlinden, D. Pierreux, H. B. Profijt, M. C. M. van de Sanden, W. M. M. Kessels , Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 , Electrochemical and Solid State Letters , 14 (2011) H1-H4, Article (), DOI