DIFFER
Plasma Solar Fuels Devices Publications

Plasma Solar Fuels Devices Publications

Displaying 281 - 290 of 331

2011

M. E. Donders, H. C. M. Knoops, M. C. M. van de Sanden, W. M. M. Kessels, P. H. L. Notten , Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films , Journal of the Electrochemical Society , 158 (2011) G92-G96, Article (), DOI
G. Dingemans, N. M. Terlinden, D. Pierreux, H. B. Profijt, M. C. M. van de Sanden, W. M. M. Kessels , Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 , Electrochemical and Solid State Letters , 14 (2011) H1-H4, Article (), DOI
F. L. Tabares, J. A. Ferreira, A. Ramos, D. Alegre, G. J. van Rooij, J. Westerhout, R. Al, J. Rapp, A. Drenik, M. Mozetic , Tritium control techniques in ITER by ammonia injection , Journal of Nuclear Materials , 1, 415 (2011) S793-S796, Article; Proceedings Paper (Aug), DOI
H. B. Profijt, P. Kudlacek, M. C. M. van de Sanden, W. M. M. Kessels , Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides , Journal of the Electrochemical Society , 158 (2011) G88-G91, Article (), DOI
R. Neu, A. Kallenbach, M. Sertoli, R. Dux, R. Fischer, J. C. Fuchs, A. Janzer, H. W. Muller, S. Potzel, T. Putterich , Tungsten behaviour in radiatively cooled plasma discharges in ASDEX Upgrade , Journal of Nuclear Materials , 1, 415 (2011) S322-S326, Article; Proceedings Paper (Aug), DOI
E. Langereis, R. Roijmans, F. Roozeboom, M. C. M. van de Sanden, W. M. M. Kessels , Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors , Journal of the Electrochemical Society , 158 (2011) G34-G38, Article (), DOI
J. W. Weber, K. Hinrichs, M. Gensch, M. C. M. van de Sanden, T. W. H. Oates , Microfocus infrared ellipsometry characterization of air-exposed graphene flakes , Applied Physics Letters , 99 (2011) 3, Article (Aug), DOI
G. J. van Rooij, J. Westerhout, S. Brezinsek, J. Rapp , Chemical erosion of carbon at ITER relevant plasma fluxes: Results from the linear plasma generator Pilot-PSI , Journal of Nuclear Materials , 1, 415 (2011) S137-S140, Article; Proceedings Paper (Aug), DOI
A. C. Bronneberg, A. H. M. Smets, M. Creatore, M. C. M. van de Sanden , On the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy , Journal of Non-Crystalline Solids , 357 (2011) 884-887, Article (Feb), DOI
G. Dingemans, M. C. M. van de Sanden, W. M. M. Kessels , Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film , Physica Status Solidi-Rapid Research Letters , 5 (2011) 22-24, Article (Jan), DOI