DIFFER
Plasma Solar Fuels Devices Publications

Plasma Solar Fuels Devices Publications

Displaying 271 - 280 of 354

2012

K. Sharma, M. V. Ponomarev, M. A. Verheijen, O. Kunz, F. D. Tichelaar, M. C. M. van de Sanden, M. Creatore , Solid-phase crystallization of ultra high growth rate amorphous silicon films , Journal of Applied Physics , 111 (2012) 5, Article; Proceedings Paper (May), DOI
M. V. Ponomarev, K. Sharma, M. A. Verheijen, M. C. M. van de Sanden, M. Creatore , Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer , Journal of Applied Physics , 111 (2012) 063715, Article (Mar), DOI
A. E. Shumack, H. J. de Blank, J. Westerhout, G. J. van Rooij , Two-dimensional electric current effects on a magnetized plasma in contact with a surface , Plasma Physics and Controlled Fusion , 12, 54 (2012) 125006, DOI
P. A. Premkumar, S. A. Starostin, H. de Vries, M. Creatore, P. M. Koenraad, W. A. MacDonald, M. C. M. van de Sanden , Surface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure , Plasma Processes and Polymers , 11-12, 9 (2012) 1194–1207, DOI
A. C. Bronneberg, N. Cankoy, M. C. M. van de Sanden, M. Creatore , Ion-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films , Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , 6, 30 (2012) 061512
J. Rapp, A. Kallenbach, R. Neu, T. Eich, R. Fischer, A. Herrmann, S. Potzel, G. J. van Rooij, J. J. Zielinski, ASDEX Upgrade Team , Radiative type-III ELMy H-mode in all-tungsten ASDEX Upgrade , Nuclear Fusion , 12, 52 (2012) 122002 ,Open Access , DOI
H. T. Beyene, J. W. Weber, M. A. Verheijen, M. C. M. van de Sanden, M. Creatore , Real time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2 , Nano Research , 5 (2012) 513-520, Article (Aug), DOI
G. Dingemans, M. C. M. van de Sanden, W. M. M. Kessels , Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses , Plasma Processes and Polymers , 9 (2012) 761-771, DOI
H. B. Profijt, M. C. M. van de Sanden, W. M. M. Kessels , Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films , Electrochemical and Solid State Letters , 15 (2012) G1-G3, Article (), DOI
M. V. Ponomarev, M. A. Verheijen, W. Keuning, M. C. M. van de Sanden, M. Creatore , Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide , Journal of Applied Physics , 112 (2012) 04370, Article (Aug), DOI