DIFFER
Plasma Solar Fuels Devices Publications

Plasma Solar Fuels Devices Publications

Displaying 251 - 260 of 346

2012

B. Hoex, M. C. M. van de Sanden, J. Schmidt, R. Brendel, W. M. M. Kessels , Surface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3 , Physica Status Solidi-Rapid Research Letters , 6 (2012) 4-6, Article (Jan) ,Open Access , DOI
A. C. Bronneberg, M. C. M. van de Sanden, M. Creatore , Remote plasma deposition of microcrystalline silicon thin-films: Film structure and the role of atomic hydrogen , Journal of Non-Crystalline Solids , 358 (2012) 379-386, Article (Jan), DOI
H. C. M. Knoops, E. Langereis, M. C. M. van de Sanden, W. M. M. Kessels , Reaction mechanisms of atomic layer deposition of TaN(x) from Ta(NMe(2))(5) precursor and H(2)-based plasmas , Journal of Vacuum Science & Technology A , 30 (2012) 01A101, Article (Jan), DOI
K. Sharma, M. A. Verheijen, M. C. M. van de Sanden, M. Creatore , In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers , Journal of Applied Physics , 111 (2012) 6, Article (Feb), DOI
G. J. van Rooij, G. M. Wright , Diagnostics for erosion and deposition processes in fusion plasmas , Fusion Science and Technology , 61 (2012) 394-401, Article (Feb)
M. V. Ponomarev, K. Sharma, M. A. Verheijen, M. C. M. van de Sanden, M. Creatore , Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer , Journal of Applied Physics , 111 (2012) 063715, Article (Mar), DOI
G. Dingemans, F. Einsele, W. Beyer, M. C. M. van de Sanden, W. M. M. Kessels , Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface , Journal of Applied Physics , 111 (2012) 093713, DOI
G. Aresta, J. Palmans, M. C. M. van de Sanden, M. Creatore , Evidence of the filling of nano-porosity in SiO2-like layers by an initiated-CVD monomer , Microporous and Mesoporous Materials , 151 (2012) 434-439, Article (Mar), DOI
G. Aresta, J. Palmans, M. C. M. van de Sanden, M. Creatore , Initiated-chemical vapor deposition of organosilicon layers: Monomer adsorption, bulk growth, and process window definition , Journal of Vacuum Science & Technology A , 30 (2012) 11, Article (Jul), DOI
G. A. van Swaaij, K. Bystrov, D. Borodin, A. Kirschner, L. B. van der Vegt, G. J. van Rooij, G. De Temmerman, W. J. Goedheer , Dissociative recombination and electron-impact de-excitation in CH photon emission under ITER divertor-relevant plasma conditions , Plasma Physics and Controlled Fusion , 54 (2012) 095013, Article (Sep) ,Open Access , 2012_49368.pdf , DOI