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Plasma Solar Fuels Devices Publications

Plasma Solar Fuels Devices Publications

Displaying 291 - 300 of 365

2012

G. Dingemans, M. C. M. van de Sanden, W. M. M. Kessels , Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses , Plasma Processes and Polymers , 9 (2012) 761-771, DOI
H. B. Profijt, M. C. M. van de Sanden, W. M. M. Kessels , Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films , Electrochemical and Solid State Letters , 15 (2012) G1-G3, Article (), DOI
M. V. Ponomarev, M. A. Verheijen, W. Keuning, M. C. M. van de Sanden, M. Creatore , Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide , Journal of Applied Physics , 112 (2012) 04370, Article (08/2012), DOI

2011

N. Leick, R. O. F. Verkuijlen, L. Lamagna, E. Langereis, S. Rushworth, F. Roozeboom, M. C. M. van de Sanden, W. M. M. Kessels , Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma , Journal of Vacuum Science & Technology A , 29 (2011) 021016, Article (03/2011), DOI
K. Sharma, A. Branca, A. Illiberi, F. D. Tichelaar, M. Creatore, M. C. M. van de Sanden , On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon , Advanced Energy Materials , 1 (2011) 401-406, Article (05/2011), DOI
G. Dingemans, N. M. Terlinden, M. A. Verheijen, M. C. M. van de Sanden, W. M. M. Kessels , Controlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition , Journal of Applied Physics , 110 (2011) 6, Article (11/2011), DOI
G. Dingemans, M. M. Mandoc, S. Bordihn, M. C. M. van de Sanden, W. M. M. Kessels , Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks , Applied Physics Letters , 98 (2011) 222102, Article (05/2011), DOI
W. E. N. van Harskamp, C. M. Brouwer, D. C. Schram, M. C. M. van de Sanden, R. Engeln , Population inversion in a magnetized hydrogen plasma expansion as a consequence of the molecular mutual neutralization process , Physical Review E , 83 (2011) 036412, Article (03/2011), DOI
G. Dingemans, A. Clark, J. A. van Delft, M. C. M. van de Sanden, W. M. M. Kessels , Er3+ and Si luminescence of atomic layer deposited Er-doped Al2O3 thin films on Si(100) , Journal of Applied Physics , 109 (2011) 9, Article (06/2011), DOI
H. B. Profijt, S. E. Potts, M. C. M. van de Sanden, W. M. M. Kessels , Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges , Journal of Vacuum Science & Technology A , 29 (2011) 26, Review (09/2011), DOI