DIFFER
Plasma Solar Fuels Devices Publications

Plasma Solar Fuels Devices Publications

Displaying 291 - 300 of 346

2011

B. Unterberg, R. Jaspers, R. Koch, V. Massaut, J. Rapp, D. Reiter, S. Kraus, A. Kreter, V. Philipps, H. Reimer , New linear plasma devices in the trilateral euregio cluster for an integrated approach to plasma surface interactions in fusion reactors , Fusion Engineering and Design , 9-11, 86 (2011) 1797-1800, Article; Proceedings Paper (Oct), DOI
T. Zaharia, P. Kudlacek, M. Creatore, R. Groenen, P. Persoone, M. C. M. van de Sanden , Improved adhesion and tribological properties of fast-deposited hard graphite-like hydrogenated amorphous carbon films , Diamond and Related Materials , 20 (2011) 1266-1272, Article (Oct), DOI
O. G. Kruijt, J. Scholten, P. H. M. Smeets, S. Brons, H. J. N. van Eck, R.S. Al, M. A. van den Berg, H. J. van der Meiden, G. J. van Rooij, P. A. Zeijlmans van Emmichoven , Thermal effects and component cooling in Magnum-PSI , Fusion Engineering and Design , 86 (2011) 1724-1727, Article; Proceedings Paper (Oct), DOI
K. B. Jinesh, J. L. van Hemmen, M. C. M. van de Sanden, F. Roozeboom, J. H. Klootwijk, W. F. A. Besling, W. M. M. Kessels , Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films , Journal of the Electrochemical Society , 158 (2011) G21-G26, Article (), DOI
M. E. Donders, H. C. M. Knoops, M. C. M. van de Sanden, W. M. M. Kessels, P. H. L. Notten , Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films , Journal of the Electrochemical Society , 158 (2011) G92-G96, Article (), DOI
G. Dingemans, N. M. Terlinden, D. Pierreux, H. B. Profijt, M. C. M. van de Sanden, W. M. M. Kessels , Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 , Electrochemical and Solid State Letters , 14 (2011) H1-H4, Article (), DOI
F. L. Tabares, J. A. Ferreira, A. Ramos, D. Alegre, G. J. van Rooij, J. Westerhout, R. Al, J. Rapp, A. Drenik, M. Mozetic , Tritium control techniques in ITER by ammonia injection , Journal of Nuclear Materials , 1, 415 (2011) S793-S796, Article; Proceedings Paper (Aug), DOI
H. B. Profijt, P. Kudlacek, M. C. M. van de Sanden, W. M. M. Kessels , Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides , Journal of the Electrochemical Society , 158 (2011) G88-G91, Article (), DOI
R. Neu, A. Kallenbach, M. Sertoli, R. Dux, R. Fischer, J. C. Fuchs, A. Janzer, H. W. Muller, S. Potzel, T. Putterich , Tungsten behaviour in radiatively cooled plasma discharges in ASDEX Upgrade , Journal of Nuclear Materials , 1, 415 (2011) S322-S326, Article; Proceedings Paper (Aug), DOI
E. Langereis, R. Roijmans, F. Roozeboom, M. C. M. van de Sanden, W. M. M. Kessels , Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors , Journal of the Electrochemical Society , 158 (2011) G34-G38, Article (), DOI